Silicon Valley-based D2S revealed last week that it had solved the last problem in a nascent technique called inverse lithography technology, or ILT. The breakthrough could speed the process of making chips and allow semiconductor fabs to produce more advanced chips without upgrading equipment. The solution, a custom-built computer system, reduces the amount of time needed for a critical step from several weeks to a single day.
In most of the photolithography used to make today’s microchips, light with a wavelength of 193-nanometers is shown through lenses and a patterned photomask, so that the pattern is shrunk down and projected onto the silicon wafer where it defines device and circuit features. (The most modern chip making technology, extreme ultraviolet lithography, works a bit differently. But, only a few chipmakers have these tools.)